|Spatial resolution||2 x 2 µm|
|Energy range (keV)||2.05 - 20.5|
|Core energy range (keV)||5 - 15|
|Energy resolution (Δ E/E)||Si 111: 1.4 x 10-4|
|Energy stability (eV)||+/- 0.05 per day|
|Full beam size Flux @ 10 keV at sample (ph/s)||2 x 1012|
|Beam size at sample (µm) at full flux||7 (H) x 1.8 (V)|
|Minimum beam size at sample (µm)||2 (H) x 1.8 (V)|
|Beam divergence at sample (mrad) (FWHM)||3 (H) x 2 (V)|
|Beam position stability at sample||<1 µm per day|
|Sample volume:||Max dimension 25 mm|
|Temperature range:||20 - 1500 K|
- A high rate fluorescence 9 element solid state detector system optimised for energies above 5 keV.
- A 4 element Si Drift fluorescence detector for below 15 keV
- A 6 element Si Drift fluoresence detector for below 15 keV.
- A monochromatic beam intensity monitoring system for IO measurements.
- A CCD detector to allow for transmission diffraction experiments.
- Electron yield vacuum cell with heating capabilities to 800K.
The optical scheme of I18 is based on three mirrors and a liquid nitrogen-cooled double crystal monochromator.
The first device, at 25 m from the source, is a water-cooled Rh-coated Silicon toroidal mirror. This focuses the beam in the horizontal plane at 37.5 m from the source, and collimates it in the vertical direction.
Next is the fixed-exit monochromator which has one sets of crystals Si(111). The angular range of the monochromator is such that it can cover from 2.05 – 20.5 keV on the Si(111) set, for higher resolution the Si(333) reflection may be used above 6 keV.
The last two pairs of mirrors are in the experimental hutch. First there is a pair of plane mirrors, which can used for harmonic rejection at low energies ( <4 keV) . These mirrors have two stripes for use at various energies, Rh and Ni.
Finally there are the Kirkpatrick-Baez focusing mirrors. These are non-chromatic and are therefore ideal for energy scanning applications like EXAFS (extended X-ray absorption fine structure), and will operate over the full beamline energy range, using two stripes, Rh and Si.
|Insertion device||2 m U27 in-vacuum undulator|
|Nominal magnet length (m)||2|
|Nominal magnet gap (mm)||7|
|Magnet period (mm)||27|