Principal Beamline Scientist:
Georg Held
Tel: +44 (0) 1235 778480
E-mail: [email protected]
Email: [email protected]
Tel: +44 (0)1235 778290
Potential users are encouraged to contact the B07 beamline team and discuss any proposals in detail.
Beamline
|
Equipment or Component |
Availability |
| B07-C branchline (AP-XPS) | Available |
| B07-B branchline (NEXAFS / UHV XPS) | Available |
B07-B High Throughput UHV XPS End Station (ES-1)
| Techniques |
UHV XPS UHV NEXAFS (TEY, AEY, TFY and PFY) |
| Sample preparation chamber |
Ar sputtering LEED Evaporators |
| Pressure Range | 10-10 - 10-6 mbar |
| Sample temperature | 120 - 1250 K (UHV) |
B07-B Ambient Pressure NEXAFS End Station (ES-2)
| Tecniques | Ambient Pressure NEXAFS (TEY, TFY) |
| Pressure Range | 10-7 - 50 mbar |
| Sample temperature | 300 - 450 K |
| Sample enviroment | compatible with liquid cells and high pressure gas cells (contact Beamline team) |
B07-C (AP-XPS) End Station
|
Techiques |
AP-XPS AP-NEXAFS : Auger Electron Yield, Partial Electron Yield, Total Electron Yield. |
| Maximum ambient pressure | Up to 10-30 mbar depending on the gas (if higher pressures are required, please contact the beamline staff for more information). |
|
Sample temperature |
250 K - 750 K (ambient pressure); 150 K - 1000 K (UHV) |
|
Gas mixing rig |
Please contact the beamline staff for more information. |
|
Sample preparation chamber |
Detachable UHV chamber. LEED, gas dosing, sputter gun, provision for evaporator sources. Sample temperature range: 150K - 1000K. |
|
Liquid samples/jets |
Not yet implemented; if you have a particular setup in mind then please discuss with the beamline team. |
Support Facilities (contact Beamline team)
|
Offline UHV lab |
Gas Chromatograph Tube furnace Cluster source Please inquire to find out more information. |
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