The specifications of the PEEM are meant as guidelines for ideal experimental conditions. These conditions can be summarized as: good surface conductivity, clean and atomically flat surface, stability and UHV compatibility. Achievement of high-resolution requires a lot of effort and has to be discussed with the beamline staff.
|Elmitec SPELEEM III
|PEEM illumination sources
|Electron Illumination aperture
The fields of view may vary between 80 um and 2 um. For LEEM, the largest field of view is limited to 50 um by the size of the illumination source.
One evaporation source is available in the main chamber and two in the preparation chamber. EFM 3 evaporators are currently fitted. For available evaporants and crucibles, please discuss your needs with the beamline staff. The access to the chambers is through a DN40 flange with an inner bore diameter is 38 mm. For the distances to the sample, please contact the beamline staff.
Evaporation of most metallic compounds is allowed (Au, Ag, Co, Cu, Fe, ...). Volatile metals are NOT allowed. Details must be discussed with beamline staff before experiment starts.
Dosing of gasses is possible and has to be agreed with the beamline staff well in advance of the experiment starting.
Feasibility of evaporation of volatile organic molecules in the PEEM chamber or preparation chamber must be discussed with beamline staff.
The preparation chamber is equipped with the capabilities listed in the table below :
|UHV in-situ sample preparation
The transfer of the sample is done through a load-lock system and the complete transfer from air to measuring position in PEEM takes approximately 15 minutes.
Fig. 1: LaserPEEM/LEEM sample preparation chamber.
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