Facility specification
Optics
|
Source |
5m Apple II elliptically polarizing undulator |
|
Energy range |
250 eV – 2000 eV (up to 3500 eV with upgrade) |
|
Polarization |
Left/right circular polarized Linear horizontal/vertical/arbitrary |
|
Spot size at sample |
Min 50 nm @ 700 eV |
|
Photon flux at sample |
Max 1011 photons/s @ 700 eV |
Quantum Materials Imaging endstation
|
Magnetic field |
0 – 250 mT (in-plane and out-of-plane) |
|
Temperature |
20 – 300 K |
|
Electrical connections |
RF excitation / pulsing / biasing |
Functional Materials Imaging endstation
|
Electrochemical reaction cell |
Liquid flow and electrical connections |
|
Gas reaction cell |
Gas flow / mixing and heating |
