This page contains a timeline showing the different beamline capabilities that will become available by March 2010.
Experimental Hutch 1 and sample preparation area
| Schedule | Experiments Available/ Equipment or Component | Comments / Aims |
|---|---|---|
| October 2009 | General: Simple reflectivity on diffractometer Sample Chamber: simple environment chamber or in air. Diffractometer: available but only angle settings Detectors: Scintillator / Pilatus 100K / APD | First User(s) Check diffractometer ranges and usability of software. Use of 2d detector for reflectivity. |
| November 2009 | General: Reflectivity from more complex samples Sample Chamber: as above plus UHV baby chamber. Diffractometer: available but only angle settings Detectors: Scintillator / Pilatus 100K / APD | Build up range of sample environments offered and integrated |
| December 2009 | General: GISAXS measurements Sample Chamber: as above Diffractometer: Sample support Detectors: Large Area Detector – Pilatus P2M on positioning stage. | Possibility of combined reflectivity/GISAXS measurements |
| January 2010 | General: Surface X-ray Diffraction Sample Chamber: as above Diffractometer: Full angle calculations to move around in reciprocal space Detectors: As above | Test angle calculation software on range of samples and environments. |
| March 2010 | General: More complex experiments Sample Chamber: as above / simple troughs available for liquid measurements. Diffractometer: As above | Any measurement of above but with more complexity / combined measurements |
| Mid-2010 | Experimental Hutch 1 fully available as in design specs | Reduced user time due to commissioning of cryo-cooled undulator |
Experimental Hutch 2 and sample preparation area
| Schedule | Experiments Available/ Equipment or Component | Comments / Aims |
|---|---|---|
| Mid-2010 | Will house in-situ UHV chamber | Equipment to be installed in mid-2010 |
Optics Hutch
| Schedule | Experiments Available/ Equipment or Component | Comments / Aims |
|---|---|---|
| October 2009 | ~100 micron spot at sample Energy range available ~8–20 keV | |
| Mid-2010 | Energy range ~8–30 keV once cryo-undulator is installed | Cryo-undulator installation set for June 2010 |
For any further information, please contact a member of the beamline staff.