PEEM
Last reviewed: 19 July 2011
| Equipment or Component | Availability | Comments |
| UVPEEM | Available | Only for low work-functions samples |
| LEEM | Available | 15nm resolution for a good sample |
| XPEEM | Available | 50-100nm resolution for a good sample |
| Spatially resolved XPS | Available | 100nm + 300meV resolution in imaging mode*, 2μm + 220meV resolution in micro - XPS |
| micro-LEED | Available | |
| Evaporators | Available | Details must be discussed with PBS Ga, Sb, organic molecules not permitted |
| Gas dosing | Available | Details must be discussed with PBS |
| Current pulsing (for domain walls), application of bias voltage and electric fields | Available | Details must be discussed with PBS |
PEEM Preparation Chamber
| Sample into chamber from air < 10 mins | Available | For low out-gassing samples |
| LEED | Available | |
| Auger | Available | |
| Sputtering | Available | |
| Annealing | Available | Up to 2000°C (for short periods) |
| Evaporators | Available | Organic molecules are not permitted |
| Gas dosing | Available | Available on request |
| STM | Available | Annealing to <600°C |
| Single crystals available | Available | Cu(100), Cu (110), Cu (111), Pd (111), Pt(111), Au (111), Ag(111), W(110), Si(111),Si(100) |
Branchline
| Beam height 1415 mm | At focus | |
| X-ray Absorption Spectroscopy Chamber, T=7K – 300K TEY Detection Fluorescence Detection | Available | Details must be discussed with PBS |
| 6T Superconducting Magnet T= 1.5K – 400K | Available | |
| User endstation can be attached | User endstation can be attached after discussion with PBS |
Support Facilities
| AFM | Available | |
| Optical Microscope | Available | |
| Wire bonder | Available | |
| Magnet (1 T) | Available | |
| Femtosecond laser | Available | Use to be discussed with PBS |
| UHV Laboratory | Available | Use to be discussed with PBS |