Recently, my core research has been to originate and drive the development of a new high resolution diffraction technique based on multiple scattering. The technique uses an extended form of multiple scattering in which the diffuse signal arising from crystallographic imperfections produces tunable diffraction lines which can be observed away from the Bragg condition. The shape and relative positions of these lines provides a unique fingerprint describing the strain within the target materials. The technique has been termed Diffuse Multiple Scattering (DMS) and is relatively insensitive to the geometrical uncertainties of the experimental set up and can provide exceptional high resolution three dimensional information without having to move the sample. Furthermore, as the DMS signal is provided at the energy of the incident beam, multiple line intersections can be forced as is the case with Kikuchi lines. However, unlike Kikuchi lines, DMS lines are not perturbed by magnetic and electric fields, thus making them extremely powerful for field dependent measurements.